The 16th European Microscopy Congress 2016
Effect of electron dose density on silicon nitride compared between two different atomic column elemental maps by 2D moiré and conventional methods
1. EM business unit, JEOL Ltd., Tokyo, Japon
A challenge to expand a variety of samples in atomic column elemental mapping [1] is to overcome the sample damage caused by electron beam irradiation,…
Official abstracts site for the European Microscopy Congress