Articles tagged "atomic layer deposition"

The 16th European Microscopy Congress 2016
Factors limiting the doping efficiency in atomic layer deposited ZnO:Al thin films: a dopant distribution study by transmission electron microscopy and atom probe tomography
Marcel Verheijen (1, 2), Yizhi Wu (2), Devin Giddings (3), Ty Prosa (3), David Larson (3), Fred Roozeboom (2), Erwin Kessels (2)
1. Innovation Labs, Philips, Eindhoven, Pays-Bas 2. Applied Physics, Eindhoven University of Technology, Eindhoven, Pays-Bas 3. CAMECA Instruments Inc, CAMECA Instruments Inc, Madison, Etats-Unis
Transparent conducting oxides (TCOs), such as indium tin oxide (ITO), are commonly used as transparent electrodes in a wide variety of devices, such as in…
The 16th European Microscopy Congress 2016
Controlling the grain size of polycrystalline TiO2 films grown by atomic layer deposition
Ivna Kavre Piltaver (1), Ivana Jelovica Badovinac (1), Iva Saric (2), Robert Peter (1), Gabriela Ambrozic (1), Ales Omerzu (1), Mladen Petravic (1)
1. Department of Physics and Center for Micro and Nano Sciences and Technologies, University of Rijeka, Rijeka, Croatie 2. Faculty of Civil Engineering and Center for Micro and Nano Sciences and Technologies, University of Rijeka, Rijeka, Croatie
Titanium dioxide (TiO2) is a widely used material for photocatalytic, optical, electrical and medical applications. Atomic layer deposition (ALD) represents an excellent technique for the…